電漿輔助化學氣相沉積系統 PECVD

聯絡方式 Contact

儀器管理者 Instrument administrator

邱昱銓 Yu-Chuan Chiu  TEL: 03-5712121 ext 59313

EMAIL: w4204ww@gmail.com

對外開放服務時間 Opening hours

週一~週日 上午8:00~下午5:00 開放白天權限使用者。 下午5:00過後只開放有夜間權限使用者。

Monday~Sunday: 8:00am to 5:00pm for users with day-time license. Only users with night license is available after 5:00pm.

儀器放置位置 (Position) : R222

使用功能說明 Applications

1. SiNx deposition
2. SiOx deposition
3. 管理員考核

規格 Specifications

中文名稱:電漿輔助化學氣相沉積系統
Instrument:Plasma-Enhanced Chemical Vapor Deposition
廠牌及型號:OXFORD INSTRUMENTS,Plasmalab80Plus
Brand and System model:OXFORD INSTRUMENTS,Plasmalab80Plus

收費標準 Fee

會員收費標準(membership fee):

項目
(item)
一般學術計畫
(Academic institute)
費用
(Fee)
委託操作
(Commissioning fee )
1800 (NT/hr)
自行操作
(independent-operation fee)
700 (NT/hr))
操作訓練
(Training by administrator)
1800 (NT/hr)

一般收費標準(non-membership fee):

項目
(item)
一般學術計畫
(Academic institute)
產業界
(Cooperation)
費用
(Fee)
委託操作
(Commissioning fee )
1600 (NT/hr) 3200 (NT/hr)
自行操作
(independent-operation fee)
800 (NT/hr)
單次申請至少儲值30小時
不開放 (N/A)
操作訓練
(Training by administrator)
1600 (NT/hr) 不開放 (N/A)

管理及服務辦法 User regulations

1.申請前須知(Notice before any application)
本機台為B級機台,提供委託及自行操作服務,自行操作僅限加入會員之單位,且須事前有儲值固定單位金額以供後續自行操作收費。
The system is classified as a Grade B instrument with two available ways for having process on this system.
(a) People with qualified license are allowed
(b) Process can be done by the help of the administrator through commissioned application.
Option (a) is only available for people in the organizations belong to the membership of the center. And the organization has to deposit certain amount of money for each system for the cost of every independent operation.
申請委託操作者須事先與儀器管理員連絡並進行實驗討論評估,確認樣品及製程可使用本機台,並由管理員估價計算費用後,經指導教授或主管同意後,方可提出使用申請。
Those applying for commissioned operation should discuss and evaluate the experiment with the instrument administrator in advance, ensuring that the sample and fabrication process are suited for the instrument. The application can be filed after the cost is estimated by the administrator and approved by either the advisor or the supervisor.』

2. 預約與自行操作須知 (Booking and Independent Operation)
請自行上網預約直接安排時段。
Please go to the booking system online to select slots.
此項儀器開放通過考核者於上班及非上班時段自行操作,凡使用者應自行詳細確實的填寫儀器使用紀錄簿,並註明所發生的任何異常狀況,違者停止使用資格 3 個月。
Every user has to record the process that have been done and any abnormal situations happened during the process on the user-record book. The eligibility of using the machine will be banned for three months if any user does not follow the rule.
若因個人操作不當造成儀器損壞,本中心可視情況要求操作者所屬實驗室主管做合理的賠償,唯匿情不報者除要求賠償外,並撤銷其單位往後的使用資格。
If the system is broken due to personal improper operation, CNT would require the reasonable compensation from the laboratory to which the user is belonged. In addition, if the user is found to hide the fact of his/her improper operation, all the people from same laboratory will no longer have the right to use the machine.

3. 申請委託服務之方法 (Application for commissioned application)
自行下載『 ICP/RIE 一般使用者儀器使用、訓練、委託操作申請表暨經費轉帳核准單 』,完成申請程序後自行與儀器聯絡人接洽委託操作事宜。
務必詳實填寫樣品結構、實驗材料及蝕刻深度等實驗需求。
Please go to the website and download the “PECVD application form” online and email the completed form, including details about the user and lamella, to lcli@faculty.nctu.edu.tw. We will respond to your application and the required fee as soon as possible.
申請人於預約時段前 1 天 將試片送交儀器聯絡人,申請人委託前請與儀器聯絡人洽談細節,每星期送件上限4小時。
Applicants need to give samples at least one day before the experimental date. Please check the detail with the administrator to avoid any misunderstandings.
儀器聯絡人得視需要可要求申請人在現場共同進行實驗。
Applicants may be required to come with the administrator for the experiment depending on the content of application requirement.

自行操作訓練與考核辦法 Guideline for independent operation and evaluation

初次加入會員之單位之申請者,請下載『 PECVD 一般使用者儀器使用、訓練、委託操作申請表暨經費轉帳核准單』,完成申請程序並且儲值金額後,請去奈米中心網站下載「非奈中使用儀器申請表」,完成相關填寫以及跑完規定流程後,自行或與儀器聯絡人接洽訓練事宜。請事先確認是否有上過相關奈中規定之公安及半導體實驗課程,取得奈米中心進入無塵室資格後,始可接受訓練。
(a) If you are the user that your laboratory is not a membership of CNT yet or your laboratory do not have any money deposited for PECVD, please go to the website and download the “PECVD application form” online and email the completed form, including details about the user and lamella, to lcli@faculty.nctu.edu.tw. We will respond to your application as soon as possible.
(b) Once the application gets approved or your laboratory is already the membership of CNT and has money deposited for PECVD, please go to the website of NFC and download the “ User’s form B (非奈中儀器使用儀器申請表)”. And please fill the necessary materials and finish required administrative flows before getting training.
(c) Students who finish (a) and (b) can start to receive the training from either users who have been qualified or the administrator.
Notice: Applicants need to take safety course and semiconductor courses to reach the requirements for entering NFC cleanroom before any applications (please check on NFC website for detail).
考核通過者若連續 3個月無自行操作紀錄,請先洽詢儀器聯絡人再視情況開放自行操作。
If the user with license has not been using the machine for 3 months, administrator has the right to cancel his/her license

樣品規範 Sample specifications

本系統提供SiO2、Si3N4材料之沉積。使用上除了完整晶圓,破片也可以用,若過小的破片需用中心準備的片子作為擋片,基板材料限制為Si和三五族的基材。
The chamber size is 8inch with uniform area in centered 6inch, and the temperature range for the process is 80-300 ℃. Both whole wafers and Broken pieces are available for the process. Please prepare clean carrier wafers and put them around the sample if the sample size is too small to avoid the shift of sample to the edge during the gas flow. Only Si and III-IV substrate are allowed for this machine.
可在低溫下,進行含有金屬的試片製程,但所要進去的金屬種類要先行告知,以利機台管理人進行管理。
Samples with metal pattern may be allowed under low-temp process (80℃). Please inform and check with the administrator in advance.

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